@misc{indiciae66f0a643a850,
  title = {Electromagnetic modeling of near-field phase-shifting contact lithography with broadband ultraviolet illumination},
  author = {Fei Wang and Katherine E. Weaver and Akhlesh Lakhtakia and Mark W. Horn},
  year = {2019},
  doi = {10.1016/j.ijleo.2004.10.001},
  url = {https://arxiv.org/abs/1909.13618},
  note = {Source identifier: 1909.13618}
}