@misc{indiciaead2fb6d66dfa,
  title = {Patterning Sn-based EUV resists with low-energy electrons},
  author = {Ivan Bespalov and Yu Zhang and Jarich Haitjema and Rudolf M. Tromp and Sense Jan van der Molen and Albert M. Brouwer and Johannes Jobst and Sonia Castellanos},
  year = {2019},
  url = {https://arxiv.org/abs/1910.02511},
  note = {Source identifier: 1910.02511}
}