@misc{indiciae09866552cdc2,
  title = {Deep Learning Regression of VLSI Plasma Etch Metrology},
  author = {Jack Kenney and John Valcore and Scott Riggs and Edward Rietman},
  year = {2019},
  url = {https://arxiv.org/abs/1910.10067},
  note = {Source identifier: 1910.10067}
}