@misc{indiciaeb038dd3e5825,
  title = {Local removal of silicon layers on Si(100)-2x1 with chlorine-resist STM lithography},
  author = {T. V. Pavlova and V. M. Shevlyuga and B. V. Andryushechkin and G. M. Zhidomirov and K. N. Eltsov},
  year = {2020},
  doi = {10.1016/j.apsusc.2019.145235},
  url = {https://arxiv.org/abs/2001.04845},
  note = {Source identifier: 2001.04845}
}