TY  - RPRT
TI  - Local removal of silicon layers on Si(100)-2x1 with chlorine-resist STM lithography
AU  - T. V. Pavlova
AU  - V. M. Shevlyuga
AU  - B. V. Andryushechkin
AU  - G. M. Zhidomirov
AU  - K. N. Eltsov
PY  - 2020
DO  - 10.1016/j.apsusc.2019.145235
UR  - https://arxiv.org/abs/2001.04845
ID  - 2001.04845
ER  -