@misc{indiciae87a25d76c710,
  title = {Efficient Bayesian inversion for shape reconstruction of lithography masks},
  author = {Nando Farchmin and Martin Hammerschmidt and Philipp-Immanuel Schneider and Matthias Wurm and Bernd Bodermann and Markus Bär and Sebastian Heidenreich},
  year = {2020},
  doi = {10.1117/1.jmm.19.2.024001},
  url = {https://arxiv.org/abs/2005.05164},
  note = {Source identifier: 2005.05164}
}