@misc{indiciaecddd2cd12e9a,
  title = {Fatigue and retention in the growth window of ferroelectric Hf0.5Zr0.5O2 thin films},
  author = {Jike Lyu and Ignasi Fina and Florencio Sanchez},
  year = {2020},
  doi = {10.1063/5.0017738},
  url = {https://arxiv.org/abs/2008.07395},
  note = {Source identifier: 2008.07395}
}