TY  - RPRT
TI  - Fatigue and retention in the growth window of ferroelectric Hf0.5Zr0.5O2 thin films
AU  - Jike Lyu
AU  - Ignasi Fina
AU  - Florencio Sanchez
PY  - 2020
DO  - 10.1063/5.0017738
UR  - https://arxiv.org/abs/2008.07395
ID  - 2008.07395
ER  -