TY  - RPRT
TI  - Interface study of thermally driven chemical kinetics involved in Ti/Si3N4 based metal-substrate assembly by X-ray photoelectron spectroscopy
AU  - Sachin Yadav
AU  - Sangeeta Sahoo
PY  - 2020
DO  - 10.1016/j.apsusc.2020.148465
UR  - https://arxiv.org/abs/2011.09360
ID  - 2011.09360
ER  -