@misc{indiciae899640263436,
  title = {Selective Etching of Hexagonal Boron Nitride by High-Pressure CF4 Plasma for Individual One-dimensional Ohmic Contacts to Graphene Layers},
  author = {Yuta Seo and Satoru Masubuchi and Eisuke Watanabe and Momoko Onodera and Rai Moriya and Kenji Watanabe and Takashi Taniguchi and Tomoki Machida},
  year = {2020},
  doi = {10.1063/5.0022557},
  url = {https://arxiv.org/abs/2012.02416},
  note = {Source identifier: 2012.02416}
}