@misc{indiciae68446534a600,
  title = {Surface Diffusion Control Enables Tailored Aspect Ratio Nanostructures in Area-Selective Atomic Layer Deposition},
  author = {Philip Klement and Daniel Anders and Lukas Gümbel and Michele Bastianello and Fabian Michel and Jörg Schörmann and Matthias T. Elm and Christian Heiliger and Sangam Chatterjee},
  year = {2020},
  url = {https://arxiv.org/abs/2012.04465},
  note = {Source identifier: 2012.04465}
}