TY  - RPRT
TI  - Limiting Regimes for Electron-Beam Induced Deposition of Copper from Aqueous Solutions Containing Surfactants
AU  - Samaneh Esfandiarpour
AU  - J. Todd Hastings
PY  - 2020
UR  - https://arxiv.org/abs/2012.06854
ID  - 2012.06854
ER  -