TY  - RPRT
TI  - Atomic Layer Deposition of Aluminum (111) Thin Film by Dimethylethylaminealane Precursor
AU  - Sameh Okasha
AU  - Yoshiaki Sekine
AU  - Satoshi Sasaki
AU  - Yuichi Harada
PY  - 2021
UR  - https://arxiv.org/abs/2101.04366
ID  - 2101.04366
ER  -