@misc{indiciae04f11c2c343d,
  title = {Aluminum Oxide at the Monolayer Limit via Oxidant-free Plasma-Assisted Atomic Layer Deposition on GaN},
  author = {Alex Henning and Johannes D. Bartl and Andreas Zeidler and Simon Qian and Oliver Bienek and Chang-Ming Jiang and Claudia Paulus and Bernhard Rieger and Martin Stutzmann and Ian D. Sharp},
  year = {2021},
  url = {https://arxiv.org/abs/2102.03642},
  note = {Source identifier: 2102.03642}
}