TY  - RPRT
TI  - The effect of the dielectric end groups on the positive bias stress stability of N2200 organic field effect transistors
AU  - D. Simatos
AU  - L. J. Spalek
AU  - U. Kraft
AU  - M. Nikolka
AU  - X. Jiao
AU  - C. R. McNeill
AU  - D. Venkateshvaran
AU  - H. Sirringhaus
PY  - 2021
DO  - 10.1063/5.0044785
UR  - https://arxiv.org/abs/2104.07089
ID  - 2104.07089
ER  -