@misc{indiciae1f9ed180aeda,
  title = {Thermal Annealing of High Dose P Implantation in 4H-SiC},
  author = {Cristiano Calabretta and Massimo Zimbone and Eric G. Barbagiovanni and Simona Boninelli and Nico Piluso and Andrea Severino and Maria A. Di Stefano and Simona Lorenti and Lucia Calcagno and Francesco La Via},
  year = {2021},
  doi = {10.4028/www.scientific.net},
  url = {https://arxiv.org/abs/2104.08882},
  note = {Source identifier: 2104.08882}
}