@misc{indiciae3821ac2e87d7,
  title = {Epitaxial Ferroelectric HfO2 Films: Growth, Properties, and Devices},
  author = {Ignasi Fina and Florencio Sanchez},
  year = {2021},
  doi = {10.1021/acsaelm.1c00110},
  url = {https://arxiv.org/abs/2104.13099},
  note = {Source identifier: 2104.13099}
}