TY  - RPRT
TI  - NaCl-assisted CVD growth of wafer scale high quality trilayer MoS$_2$ and the role of concentration boundary layer
AU  - Aditya Singh
AU  - Madan Sharma
AU  - Rajendra Singh
PY  - 2021
DO  - 10.1021/acs.cgd.1c00390
UR  - https://arxiv.org/abs/2104.15111
ID  - 2104.15111
ER  -