@misc{indiciae0dd4e862ca64,
  title = {High mobility SiMOSFETs fabricated in a full 300mm CMOS process},
  author = {Timothy N. Camenzind and Asser Elsayed and Fahd A. Mohiyaddin and Ruoyu Li and Stefan Kubicek and Julien Jussot and Pol Van Dorpe and Bogdan Govoreanu and Iuliana Radu and Dominik M. Zumbühl},
  year = {2021},
  url = {https://arxiv.org/abs/2106.05254},
  note = {Source identifier: 2106.05254}
}