@misc{indiciae228c811d7b73,
  title = {Experimental Extraction and Simulation of Charge Trapping during Endurance of FeFET with TiN/HfZrO/SiO2/Si (MFIS) Gate Structure},
  author = {Shujing Zhao and Fengbin Tian and Hao Xu and Jinjuan Xiang and Tingting Li and Junshuai Chai and Jiahui Duan and Kai Han and Xiaolei Wang and Wenwu Wang and Tianchun Ye},
  year = {2021},
  doi = {10.1109/ted.2021.3139285},
  url = {https://arxiv.org/abs/2106.15939},
  note = {Source identifier: 2106.15939}
}