TY  - RPRT
TI  - Impact of Interlayer and Ferroelectric Materials on Charge Trapping during Endurance Fatigue of FeFET with TiN/HfxZr1-xO2/interlayer/Si (MFIS) Gate Structure
AU  - Fengbin Tian
AU  - Shujing Zhao
AU  - Hao Xu
AU  - Jinjuan Xiang
AU  - Tingting Li
AU  - Wenjuan Xiong
AU  - Jiahui Duan
AU  - Junshuai Chai
AU  - Kai Han
AU  - Xiaolei Wang
AU  - Wenwu Wang
AU  - Tianchun Ye
PY  - 2021
DO  - 10.1109/ted.2021.3114663
UR  - https://arxiv.org/abs/2107.03854
ID  - 2107.03854
ER  -