TY  - RPRT
TI  - Talbot photolithography optimization with engineered hybrid metal-dielectric mask: High-contrast and highly-uniform Talbot stripes
AU  - Yu. E. Geints
AU  - I. V. Minin
AU  - O. V. Minin
PY  - 2021
DO  - 10.1016/j.optlastec.2021.107776
UR  - https://arxiv.org/abs/2109.10904
ID  - 2109.10904
ER  -