@misc{indiciae3fac0448772f,
  title = {A route to engineered high aspect-ratio silicon nanostructures through regenerative secondary mask lithography},
  author = {Martyna Michalska and Sophia K. Laney and Tao Li and Manish K. Tiwari and Ivan P. Parkin and Ioannis Papakonstantinou},
  year = {2021},
  doi = {10.1039/d1nr07024j},
  url = {https://arxiv.org/abs/2111.01698},
  note = {Source identifier: 2111.01698}
}