@misc{indiciae096eff35ea35,
  title = {Comparison of the material quality of AlxIn1-xN (x \textasciitilde{} 0-0.50) films deposited on Si (100) and (111) by reactive RF sputtering},
  author = {M. Sun and R. Blasco and M. de la Mata and S. I. Molina and A. Ajay and E. Monroy and S. Valdueza-Felip and F. B. Naranjo},
  year = {2021},
  doi = {10.3390/ma15207373},
  url = {https://arxiv.org/abs/2112.12890},
  note = {Source identifier: 2112.12890}
}