TY  - RPRT
TI  - Continuum and Molecular Modeling of Chemical Vapor Deposition over Nano-scale Substrates
AU  - Himel Barua
AU  - Alex Povitsky
PY  - 2021
DO  - 10.3390/mca28060112
UR  - https://arxiv.org/abs/2112.13154
ID  - 2112.13154
ER  -