@misc{indiciae573789263f47,
  title = {Development of SiGe Indentation Process Control for Gate-All-Around FET Technology Enablement},
  author = {Daniel Schmidt and Aron Cepler and Curtis Durfee and Shanti Pancharatnam and Julien Frougier and Mary Breton and Andrew Greene and Mark Klare and Roy Koret and Igor Turovets},
  year = {2022},
  doi = {10.1109/tsm.2022.3168585},
  url = {https://arxiv.org/abs/2201.04725},
  note = {Source identifier: 2201.04725}
}