@misc{indiciae6d1ed45471eb,
  title = {Influence of the thickness of Si and Ge films deposited on Si\$\_3\$N\$\_4\$/SiO\$\_2\$/Si substrates on their structure and diffusion of hydrogen atoms from Si\$\_3\$N\$\_4\$ layers},
  author = {Larisa V. Arapkina and Kirill V. Chizh and Dmitry B. Stavrovskii and Alexey A. Klimenko and Alexander A. Dudin and Vladimir P. Dubkov and Mikhail S. Storozhevykh and Vladimir A. Yuryev},
  year = {2021},
  url = {https://arxiv.org/abs/2201.04948},
  note = {Source identifier: 2201.04948}
}