TY  - RPRT
TI  - Influence of the thickness of Si and Ge films deposited on Si$_3$N$_4$/SiO$_2$/Si substrates on their structure and diffusion of hydrogen atoms from Si$_3$N$_4$ layers
AU  - Larisa V. Arapkina
AU  - Kirill V. Chizh
AU  - Dmitry B. Stavrovskii
AU  - Alexey A. Klimenko
AU  - Alexander A. Dudin
AU  - Vladimir P. Dubkov
AU  - Mikhail S. Storozhevykh
AU  - Vladimir A. Yuryev
PY  - 2021
UR  - https://arxiv.org/abs/2201.04948
ID  - 2201.04948
ER  -