@misc{indiciae33c3f1f105ed,
  title = {Development of hard masks for reactive ion beam angled etching of diamond},
  author = {Cleaven Chia and Bartholomeus Machielse and Amirhassan Shams-Ansari and Marko Loncar},
  year = {2022},
  doi = {10.1364/oe.452826},
  url = {https://arxiv.org/abs/2201.06416},
  note = {Source identifier: 2201.06416}
}