@misc{indiciae4e1e29eb60cf,
  title = {The method of solving initial structure by Seidel aberration theory for extreme ultraviolet lithography objective},
  author = {Wei Tan and Donglin Ma},
  year = {2022},
  url = {https://arxiv.org/abs/2203.02302},
  note = {Source identifier: 2203.02302}
}