@misc{indiciaee45922a74df6,
  title = {Scalable, Highly Crystalline, 2D Semiconductor Atomic Layer Deposition Process for High Performance Electronic Applications},
  author = {Nikolaos Aspiotis and Katrina Morgan and Benjamin März and Knut Müller-Caspary and Martin Ebert and Chung-Che Huang and Daniel W. Hewak and Sayani Majumdar and Ioannis Zeimpekis},
  year = {2022},
  url = {https://arxiv.org/abs/2203.10309},
  note = {Source identifier: 2203.10309}
}