@misc{indiciaee18c849bf4a6,
  title = {Realistic mask generation for matter-wave lithography via machine learning},
  author = {Johannes Fiedler and Adrià Salvador Palau and Eivind Kristen Osestad and Pekka Parviainen and Bodil Holst},
  year = {2022},
  url = {https://arxiv.org/abs/2207.08723},
  note = {Source identifier: 2207.08723}
}