@misc{indiciae27e38f1b8eb8,
  title = {Fabrication of highly resistive NiO thin films for nanoelectronic applications},
  author = {Johannes Mohr and Tyler Hennen and Daniel Bedau and Joyeeta Nag and Rainer Waser and Dirk J. Wouters},
  year = {2022},
  url = {https://arxiv.org/abs/2207.10837},
  note = {Source identifier: 2207.10837}
}