@misc{indiciaee2c94332b2b3,
  title = {Isotropic plasma-thermal atomic layer etching of aluminum nitride using SF\$\_6\$ plasma and Al(CH\$\_3\$)\$\_3\$},
  author = {Haozhe Wang and Azmain Hossain and David Catherall and Austin J. Minnich},
  year = {2022},
  url = {https://arxiv.org/abs/2209.00150},
  note = {Source identifier: 2209.00150}
}