TY  - RPRT
TI  - Isotropic plasma-thermal atomic layer etching of aluminum nitride using SF$_6$ plasma and Al(CH$_3$)$_3$
AU  - Haozhe Wang
AU  - Azmain Hossain
AU  - David Catherall
AU  - Austin J. Minnich
PY  - 2022
UR  - https://arxiv.org/abs/2209.00150
ID  - 2209.00150
ER  -