@misc{indiciae1bbdcb142bb3,
  title = {Pushing the feature size down to 11 nm by interference photolithography with hyperbolic metamaterials under conventional UV light source},
  author = {Xuefeng Yang and Shuxia Zhang and Baoji Wang and Xiaolin Cai and Xiaohua Li and Weiyang Yu and Qin Wang and snd Zhongliang Lu},
  year = {2022},
  url = {https://arxiv.org/abs/2209.02383},
  note = {Source identifier: 2209.02383}
}