TY  - RPRT
TI  - Pushing the feature size down to 11 nm by interference photolithography with hyperbolic metamaterials under conventional UV light source
AU  - Xuefeng Yang
AU  - Shuxia Zhang
AU  - Baoji Wang
AU  - Xiaolin Cai
AU  - Xiaohua Li
AU  - Weiyang Yu
AU  - Qin Wang
AU  - snd Zhongliang Lu
PY  - 2022
UR  - https://arxiv.org/abs/2209.02383
ID  - 2209.02383
ER  -