TY  - RPRT
TI  - Utilizing the sensitization effect for direct laser writing in a novel photoresist based on the chitin monomer N-acetyl-D-glucosamine
AU  - Dominic T. Meiers
AU  - Maximilian Rothammer
AU  - Maximilian Maier
AU  - Cordt Zollfrank
AU  - Georg von Freymann
PY  - 2022
UR  - https://arxiv.org/abs/2211.01193
ID  - 2211.01193
ER  -