@misc{indiciae8bd79fef49f0,
  title = {Inverse Design of High-NA Metalens for Maskless Lithography},
  author = {Haejun Chung and Feng Zhang and Hao Li and Owen D. Miller and Henry I. Smith},
  year = {2022},
  url = {https://arxiv.org/abs/2212.06441},
  note = {Source identifier: 2212.06441}
}