TY  - RPRT
TI  - Inverse Design of High-NA Metalens for Maskless Lithography
AU  - Haejun Chung
AU  - Feng Zhang
AU  - Hao Li
AU  - Owen D. Miller
AU  - Henry I. Smith
PY  - 2022
UR  - https://arxiv.org/abs/2212.06441
ID  - 2212.06441
ER  -