TY  - RPRT
TI  - Voltage-dependent first-principles simulation of insertion of chloride ions into Al/Al$_2$O$_3$ interfaces using the Quantum Continuum Approximation
AU  - Quinn Campbell
PY  - 2023
DO  - 10.1149/1945-7111/acc48b
UR  - https://arxiv.org/abs/2212.07325
ID  - 2212.07325
ER  -