TY  - RPRT
TI  - Deposition rate controls nucleation and growth during amorphous/nanocrystalline competition in sputtered Zr-Cr thin films
AU  - Q. Liebgott
AU  - A. Borroto
AU  - Z. Fernández-Gutiérrez
AU  - S. Bruyère
AU  - F. Mücklich
AU  - D. Horwat
PY  - 2023
DO  - 10.1016/j.jallcom.2022.168258
UR  - https://arxiv.org/abs/2301.08589
ID  - 2301.08589
ER  -