@misc{indiciae839408d10527,
  title = {Low-damage electron beam lithography for nanostructures on Bi\$\_2\$Te\$\_3\$-class topological insulator thin films},
  author = {Molly P. Andersen and Linsey K. Rodenbach and Ilan T. Rosen and Stanley C. Lin and Lei Pan and Peng Zhang and Lixuan Tai and Kang L. Wang and Marc A. Kastner and David Goldhaber-Gordon},
  year = {2023},
  doi = {10.1063/5.0144726},
  url = {https://arxiv.org/abs/2301.11900},
  note = {Source identifier: 2301.11900}
}