@misc{indiciae780e494a3622,
  title = {Evolution of ferroelectricity with annealing temperature and thickness in sputter deposited undoped HfO\$\_2\$ on silicon},
  author = {Md Hanif Ali and Adityanarayan Pandey and Rowtu Srinu and Paritosh Meihar and Shubham Patil and Sandip Lashkare and Udayan Ganguly},
  year = {2023},
  url = {https://arxiv.org/abs/2304.12924},
  note = {Source identifier: 2304.12924}
}