@misc{indiciaeddbb6739d008,
  title = {Isotropic plasma-thermal atomic layer etching of superconducting TiN films using sequential exposures of molecular oxygen and SF\$\_6/\$H\$\_2\$ plasma},
  author = {Azmain A. Hossain and Haozhe Wang and David S. Catherall and Martin Leung and Harm C. M. Knoops and James R. Renzas and Austin J. Minnich},
  year = {2023},
  doi = {10.1116/6.0002965},
  url = {https://arxiv.org/abs/2307.02821},
  note = {Source identifier: 2307.02821}
}