@misc{indiciae603fdbbadf11,
  title = {Inverse Lithography Physics-informed Deep Neural Level Set for Mask Optimization},
  author = {Xing-Yu Ma and Shaogang Hao},
  year = {2023},
  doi = {10.1364/ao.503332},
  url = {https://arxiv.org/abs/2308.12299},
  note = {Source identifier: 2308.12299}
}