@misc{indiciaecb595f2663c8,
  title = {Plasma sheath tailoring by a magnetic field for three-dimensional plasma etching},
  author = {E. Jüngling and S. Wilczek and T. Mussenbrock and M. Böke and A. von Keudell},
  year = {2023},
  url = {https://arxiv.org/abs/2311.08916},
  note = {Source identifier: 2311.08916}
}