TY  - RPRT
TI  - Guiding principles for the design of a chemical vapor deposition process for highly crystalline transition metal dichalcogenides
AU  - Vladislav Voronenkov
AU  - Benjamin Groven
AU  - Henry Medina Silva
AU  - Pierre Morin
AU  - Stefan De Gendt
PY  - 2024
DO  - 10.1002/pssa.202300943
UR  - https://arxiv.org/abs/2311.15007
ID  - 2311.15007
ER  -