@misc{indiciae0dd222809933,
  title = {Novel End-to-End Production-Ready Machine Learning Flow for Nanolithography Modeling and Correction},
  author = {Mohamed S. E. Habib and Hossam A. H. Fahmy and Mohamed F. Abu-ElYazeed},
  year = {2024},
  doi = {10.54364/aaiml.2024.41110},
  url = {https://arxiv.org/abs/2401.02536},
  note = {Source identifier: 2401.02536}
}