@misc{indiciae0072fec2b0c0,
  title = {Plasma potential shaping using end-electrodes in the Large Plasma Device},
  author = {R. Gueroult and S. K. P. Tripathi and F. Gaboriau and T. R. Look and N. J. Fisch},
  year = {2024},
  doi = {10.1017/s0022377824000552},
  url = {https://arxiv.org/abs/2401.06480},
  note = {Source identifier: 2401.06480}
}